1.5 μm phase-shifted DFB laser by EBX and mass-transport technique

S. Koentjoro; N. Eda; K. Furuya; Y. Suematsu

doi:10.1049/el:19850371

1.5 μm phase-shifted DFB laser by EBX and mass-transport technique

S. Koentjoro
, N. Eda
, K. Furuya
, Y. Suematsu

Department of Computational Intelligence and Systems Science, Tokyo Institute of Technology

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The phase-shifted DFB laser is fabricated by the electronbeam lithography and mass-transport technique. The reduction of threshold current and facet reflectivity was achieved by a one-step mass-transport process. Low threshold and stable single-mode operation was obtained. The effect of the phase shift was confirmed from the symmetrical subthreshold spectra.

Original language	English
Pages (from-to)	525-527
Number of pages	3
Journal	Electronics Letters
Volume	21
Issue number	12
DOIs	https://doi.org/10.1049/el:19850371
Publication status	Published - 6 Jun 1985
Externally published	Yes

Keywords

Lasers and laser applications
Semiconductor lasers

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10.1049/el:19850371

Cite this

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title = "1.5 μm phase-shifted DFB laser by EBX and mass-transport technique",

abstract = "The phase-shifted DFB laser is fabricated by the electronbeam lithography and mass-transport technique. The reduction of threshold current and facet reflectivity was achieved by a one-step mass-transport process. Low threshold and stable single-mode operation was obtained. The effect of the phase shift was confirmed from the symmetrical subthreshold spectra.",

keywords = "Lasers and laser applications, Semiconductor lasers",

author = "S. Koentjoro and N. Eda and K. Furuya and Y. Suematsu",

year = "1985",

month = jun,

day = "6",

doi = "10.1049/el:19850371",

language = "English",

volume = "21",

pages = "525--527",

journal = "Electronics Letters",

issn = "0013-5194",

publisher = "John Wiley \& Sons Inc.",

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T1 - 1.5 μm phase-shifted DFB laser by EBX and mass-transport technique

AU - Koentjoro, S.

AU - Eda, N.

AU - Furuya, K.

AU - Suematsu, Y.

PY - 1985/6/6

Y1 - 1985/6/6

N2 - The phase-shifted DFB laser is fabricated by the electronbeam lithography and mass-transport technique. The reduction of threshold current and facet reflectivity was achieved by a one-step mass-transport process. Low threshold and stable single-mode operation was obtained. The effect of the phase shift was confirmed from the symmetrical subthreshold spectra.

AB - The phase-shifted DFB laser is fabricated by the electronbeam lithography and mass-transport technique. The reduction of threshold current and facet reflectivity was achieved by a one-step mass-transport process. Low threshold and stable single-mode operation was obtained. The effect of the phase shift was confirmed from the symmetrical subthreshold spectra.

KW - Lasers and laser applications

KW - Semiconductor lasers

UR - https://www.scopus.com/pages/publications/0022419971

U2 - 10.1049/el:19850371

DO - 10.1049/el:19850371

M3 - Article

AN - SCOPUS:0022419971

SN - 0013-5194

VL - 21

SP - 525

EP - 527

JO - Electronics Letters

JF - Electronics Letters

IS - 12

ER -

1.5 μm phase-shifted DFB laser by EBX and mass-transport technique

Abstract

Keywords

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