@inproceedings{2a3fdcf8ab344247ae8fb7099b85ca28,
title = "A comparison between PECVD and ALD for the fabrication of slot-waveguide-based sensors",
abstract = "We fabricated horizontal slot waveguides using two low temperature deposition techniques ensuring the full compatibility of the processes with CMOS technology. Slots width as thin as 45 nm with smooth slot surfaces can easily be fabricated with simple photolithographic steps. Fundamental TM-like slot mode in which the E-field is greatly enhanced within slot showed a 23.9 dB/cm and a 18 dB/cm in a PECVD SiC/SiO 2/SiC and a ALD TiO 2/Al2O 3/TiO 2 vertical slot waveguide, respectively.",
keywords = "ALD, PECVD, Sensing, Silicon Carbide, Slot Waveguides, TiOO",
author = "Gr{\'e}gory Pandraud and Agung Purniawan and Eduardo Margallo-Balb{\'a}s and Sarro, {Pasqualina M.}",
year = "2012",
doi = "10.1117/12.922400",
language = "English",
isbn = "9780819491169",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Nanophotonics IV",
note = "Nanophotonics IV ; Conference date: 15-04-2012 Through 19-04-2012",
}