A comparison between PECVD and ALD for the fabrication of slot-waveguide-based sensors

Grégory Pandraud*, Agung Purniawan, Eduardo Margallo-Balbás, Pasqualina M. Sarro

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We fabricated horizontal slot waveguides using two low temperature deposition techniques ensuring the full compatibility of the processes with CMOS technology. Slots width as thin as 45 nm with smooth slot surfaces can easily be fabricated with simple photolithographic steps. Fundamental TM-like slot mode in which the E-field is greatly enhanced within slot showed a 23.9 dB/cm and a 18 dB/cm in a PECVD SiC/SiO 2/SiC and a ALD TiO 2/Al2O 3/TiO 2 vertical slot waveguide, respectively.

Original languageEnglish
Title of host publicationNanophotonics IV
DOIs
Publication statusPublished - 2012
Externally publishedYes
EventNanophotonics IV - Brussels, Belgium
Duration: 15 Apr 201219 Apr 2012

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume8424
ISSN (Print)0277-786X

Conference

ConferenceNanophotonics IV
Country/TerritoryBelgium
CityBrussels
Period15/04/1219/04/12

Keywords

  • ALD
  • PECVD
  • Sensing
  • Silicon Carbide
  • Slot Waveguides
  • TiOO

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