All ALD TiO 2-Al 2O 3-TiO 2 horizontal slot waveguides for optical sensing

A. Purniawan*, P. J. French, G. Pandraud, Y. Huang, P. M. Sarro

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

We report for the first time on the use of Atomic Layer Deposition (ALD) to produce TiO 2-AlO 3-TiO 2 horizontal slot waveguides optical sensors. The propagation losses of the waveguides are measured and found to be 18 dB/cm for the quasi-TM mode. These losses are better than the losses reported in slot waveguides made using PECVD techniques (for materials like SiC of similar refractive index as TiO 2) with the advantage of a very accurate layer thickness control thanks to the ALD process and the possibility to decrease by a factor 3 the slot size. The field being so confined in the slot we investigated allows the implementation of these slots in a cantilever based sensor. A sensitivity of 0.5 dB/nm is reported.

Original languageEnglish
Title of host publicationIEEE Sensors 2011 Conference, SENSORS 2011
Pages1954-1957
Number of pages4
DOIs
Publication statusPublished - 2011
Externally publishedYes
Event10th IEEE SENSORS Conference 2011, SENSORS 2011 - Limerick, Ireland
Duration: 28 Oct 201131 Oct 2011

Publication series

NameProceedings of IEEE Sensors

Conference

Conference10th IEEE SENSORS Conference 2011, SENSORS 2011
Country/TerritoryIreland
CityLimerick
Period28/10/1131/10/11

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