Immobilization of colloidal particles into sub-100nm porous structures by electrophoretic methods in aqueous media

K. Kusdianto; M. Nazli Naim; Keitaro Sasaki; I. Wuled Lenggoro

doi:10.1016/j.colsurfa.2014.06.042

Immobilization of colloidal particles into sub-100nm porous structures by electrophoretic methods in aqueous media

K. Kusdianto, M. Nazli Naim, Keitaro Sasaki, I. Wuled Lenggoro^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

Conventional direct current (DC) and pulse-DC assisted electrophoretic depositions of colloidal particles, with average sizes of 10 and 50. nm, into sub-100. nm scaled pore arrays made from anodized aluminum substrate has been investigated. At the applied voltages lower than the decomposition voltage of water (~1 V), the number concentration of particle deposited on the surface by conventional DC was higher than that of pulse DC. The number of deposited particles increased with increasing pH. Deposition efficiency inside the pores can be enhanced by applying pulse DC. In the case of high (~10 V) applied voltage, no particles were observed inside pores even though pulse DC has been applied. The adhesion strength (removal behavior) of deposition was evaluated by applying a particle detachment simple system based on ultrasonic energy. The particles deposited inside the pores were not detached compared with those of the surface of the substrate.

Original language	English
Pages (from-to)	142-150
Number of pages	9
Journal	Colloids and Surfaces A: Physicochemical and Engineering Aspects
Volume	459
DOIs	https://doi.org/10.1016/j.colsurfa.2014.06.042
Publication status	Published - 5 Oct 2014

Keywords

Anodic aluminum oxide
Detachment
Electrophoresis
Nanoparticle
Pulse

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10.1016/j.colsurfa.2014.06.042

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title = "Immobilization of colloidal particles into sub-100nm porous structures by electrophoretic methods in aqueous media",

abstract = "Conventional direct current (DC) and pulse-DC assisted electrophoretic depositions of colloidal particles, with average sizes of 10 and 50. nm, into sub-100. nm scaled pore arrays made from anodized aluminum substrate has been investigated. At the applied voltages lower than the decomposition voltage of water (~1 V), the number concentration of particle deposited on the surface by conventional DC was higher than that of pulse DC. The number of deposited particles increased with increasing pH. Deposition efficiency inside the pores can be enhanced by applying pulse DC. In the case of high (~10 V) applied voltage, no particles were observed inside pores even though pulse DC has been applied. The adhesion strength (removal behavior) of deposition was evaluated by applying a particle detachment simple system based on ultrasonic energy. The particles deposited inside the pores were not detached compared with those of the surface of the substrate.",

keywords = "Anodic aluminum oxide, Detachment, Electrophoresis, Nanoparticle, Pulse",

author = "K. Kusdianto and Naim, {M. Nazli} and Keitaro Sasaki and Lenggoro, {I. Wuled}",

note = "Funding Information: The authors are grateful to Drs. H. Kamiya, M. Iijima, M. Kuwata and M. Tsukada for supports, Dr. K. Kuchitsu for English-editing, Mr. Y. Yamada and M. Gen for assistance in simulation. This study was supported in part by Special Condition Funds for Promoting Science and Technology from the Japan Science and Technology Agency (JST), Grant-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (JSPS: 26420761, 23246132, 23560904) and Grants-in-Aid for Scientific Research on Innovative Areas (ASEPH) from the Ministry of Education, Culture, Sports, Science, and Technology . One of the authors{\textquoteright} (K. Kusdianto) Doctoral Program Scholarship is supported by Ministry of Education and Culture, Republic of Indonesia .",

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AU - Kusdianto, K.

AU - Naim, M. Nazli

AU - Sasaki, Keitaro

AU - Lenggoro, I. Wuled

N1 - Funding Information: The authors are grateful to Drs. H. Kamiya, M. Iijima, M. Kuwata and M. Tsukada for supports, Dr. K. Kuchitsu for English-editing, Mr. Y. Yamada and M. Gen for assistance in simulation. This study was supported in part by Special Condition Funds for Promoting Science and Technology from the Japan Science and Technology Agency (JST), Grant-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (JSPS: 26420761, 23246132, 23560904) and Grants-in-Aid for Scientific Research on Innovative Areas (ASEPH) from the Ministry of Education, Culture, Sports, Science, and Technology . One of the authors’ (K. Kusdianto) Doctoral Program Scholarship is supported by Ministry of Education and Culture, Republic of Indonesia .

PY - 2014/10/5

Y1 - 2014/10/5

N2 - Conventional direct current (DC) and pulse-DC assisted electrophoretic depositions of colloidal particles, with average sizes of 10 and 50. nm, into sub-100. nm scaled pore arrays made from anodized aluminum substrate has been investigated. At the applied voltages lower than the decomposition voltage of water (~1 V), the number concentration of particle deposited on the surface by conventional DC was higher than that of pulse DC. The number of deposited particles increased with increasing pH. Deposition efficiency inside the pores can be enhanced by applying pulse DC. In the case of high (~10 V) applied voltage, no particles were observed inside pores even though pulse DC has been applied. The adhesion strength (removal behavior) of deposition was evaluated by applying a particle detachment simple system based on ultrasonic energy. The particles deposited inside the pores were not detached compared with those of the surface of the substrate.

AB - Conventional direct current (DC) and pulse-DC assisted electrophoretic depositions of colloidal particles, with average sizes of 10 and 50. nm, into sub-100. nm scaled pore arrays made from anodized aluminum substrate has been investigated. At the applied voltages lower than the decomposition voltage of water (~1 V), the number concentration of particle deposited on the surface by conventional DC was higher than that of pulse DC. The number of deposited particles increased with increasing pH. Deposition efficiency inside the pores can be enhanced by applying pulse DC. In the case of high (~10 V) applied voltage, no particles were observed inside pores even though pulse DC has been applied. The adhesion strength (removal behavior) of deposition was evaluated by applying a particle detachment simple system based on ultrasonic energy. The particles deposited inside the pores were not detached compared with those of the surface of the substrate.

KW - Anodic aluminum oxide

KW - Detachment

KW - Electrophoresis

KW - Nanoparticle

KW - Pulse

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ER -

Immobilization of colloidal particles into sub-100nm porous structures by electrophoretic methods in aqueous media

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