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Particle Formation and Trapping Behavior in a TEOS/O2 Plasma and Their Effects on Contamination of a Si Wafer

  • Heru Setyawan
  • , Manabu Shimada*
  • , Yutaka Hayashi
  • , Kikuo Okuyama
  • , Shin Yokoyama
    • *Corresponding author for this work
  • Hiroshima University

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

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