Particle Formation and Trapping Behavior in a TEOS/O2 Plasma and Their Effects on Contamination of a Si Wafer

Heru Setyawan, Manabu Shimada*, Yutaka Hayashi, Kikuo Okuyama, Shin Yokoyama

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Particle Formation and Trapping Behavior in a TEOS/O2 Plasma and Their Effects on Contamination of a Si Wafer'. Together they form a unique fingerprint.

Engineering

Physics

Material Science