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Reaction of Cl- ions in electrolyte solution induced electrical discharge plasma in the presence of argon fine bubbles

  • Yui Hayashi
  • , Noriharu Takada
  • , Wahyudiono
  • , Hideki Kanda
  • , Motonobu Goto*
  • *Corresponding author for this work
  • Chemical Engineering Department
  • Nagoya University
  • Technical Center

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Abstract

Active chlorine species such as chlorine molecules and hypochlorous acid have been known as high performance sanitizers. They would act more reactive on chemical and biological substances when an electrical discharge was introduced in water containing an electrolyte substance. Here, the reaction of chloride (Cl-) ions were examined by introducing of a pulsed discharge plasma in sodium chloride (NaCl) solution as an electrolyte solution at room temperature. The results show that a large electrical current generated by the pulsed discharge plasma affected the reaction of Cl- ions to result available chlorine. The reaction pathway for available chlorine production was assumed similar with the reaction pathway as electrolysis. A pulsed discharge plasma in NaCl solution in the presence of argon (Ar) fine bubbles exhibited intense emissions and high electron density compared to when no Ar fine bubbles were introduced. At these conditions, the dissociation reaction rate of water increased drastically leads to the formation of 0 atoms. As a result, the reaction of Cl- ions and the available chlorine generation were also increased.

Original languageEnglish
Title of host publicationInternational Seminar on Fundamental and Application of Chemical Engineering 2016, ISFAChE 2016
Subtitle of host publicationProceedings of the 3rd International Seminar on Fundamental and Application of Chemical Engineering 2016
Editors Widiyastuti, Fadlilatul Taufany, Siti Nurkhamidah
PublisherAmerican Institute of Physics Inc.
ISBN (Electronic)9780735415102
DOIs
Publication statusPublished - 24 May 2017
Externally publishedYes
Event3rd International Seminar on Fundamental and Application of Chemical Engineering 2016, ISFAChE 2016 - East Java, Indonesia
Duration: 1 Nov 2016 → 2 Nov 2016

Publication series

NameAIP Conference Proceedings
Volume1840
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

Conference3rd International Seminar on Fundamental and Application of Chemical Engineering 2016, ISFAChE 2016
Country/TerritoryIndonesia
CityEast Java
Period1/11/16 → 2/11/16

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